发明名称 Resonator assembly comprising a silicon resonator and a quartz resonator
摘要 A resonator assembly comprising a semiconductor substrate, a resonator gyroscope, the resonator gyroscope including a first resonator formed in a layer of a first material, and an oscillator on the semiconductor substrate, the oscillator including a second resonator formed of a second material, wherein the second resonator is attached in a cavity; the cavity comprising a first recess in said layer of a first material and the edges of the first recess being attached to the substrate, or the cavity comprising a second recess in said substrate and the edges of the second recess being attached to said layer of a first material.
申请公布号 US9250074(B1) 申请公布日期 2016.02.02
申请号 US201414249723 申请日期 2014.04.10
申请人 HRL Laboratories, LLC 发明人 Kubena Randall L.;Chang David T.
分类号 G01C19/56;H03B5/32;H03H3/02;H01L41/25;H01L41/053;G01C19/5684;G01C19/5719;G01P15/14;H03B1/02;B81C1/00 主分类号 G01C19/56
代理机构 Ladas & Parry 代理人 Ladas & Parry
主权项 1. A resonator assembly comprising: a semiconductor substrate; a resonator gyroscope, the resonator gyroscope including a first resonator formed in a layer of a first material; and an oscillator on the semiconductor substrate, the oscillator including a second resonator formed of a second material; the second resonator being attached in a cavity; the cavity comprising a first recess in said layer of a first material and the edges of the first recess being attached to the substrate, or the cavity comprising a second recess in said substrate and the edges of the second recess being attached to said layer of a first material; said first resonator being formed by etching said layer of a first material after said attaching the edges of the first recess to the substrate or said attaching the edges of the second recess to said layer of a first material; and said cavity being located below a portion of said layer of a first material that is not etched when forming said first resonator.
地址 Malibu CA US