Apparatus for irradiating a substrate

摘要

Known apparatuses for irradiating a substrate include a receptacle for the substrate to be irradiated having a circular irradiation surface and a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface. The illumination length of the emitter tube includes a middle section and two end sections, the length of the middle section accounting for at least 50% of the illumination length. The receptacle and the optical emitter are movable relative to each other. An apparatus for thermal treatment of a substrate, enabling ho-mogeneous and/or rotationally symmetrical heating of the substrate and requiring less complexity in its design and control technology, includes a middle section of the emitter tube having a steadily decreasing curvature, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π.

主权项

1. An apparatus for irradiating a substrate, the apparatus comprising a receptacle for the substrate to be irradiated, the substrate having a circular irradiation surface, a first optical emitter having at least one emitter tube arranged in an illumination plane extending parallel to the irradiation surface, the at least one emitter tube comprising an illumination length having a middle section and two end sections, wherein the length of the middle section accounts for at least 50% of the illumination length, wherein the receptacle and the optical emitter are movable with respect to each other, and wherein the middle section comprises a curvature that continually decreases from one of the two end sections to the other of the two end sections, provided that the illumination length of the emitter tube extends over an angle of curvature of less than 2π it rad.