发明名称 |
Polishing pad with alignment feature |
摘要 |
Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described. |
申请公布号 |
US9249273(B2) |
申请公布日期 |
2016.02.02 |
申请号 |
US201514610991 |
申请日期 |
2015.01.30 |
申请人 |
NexPlanar Corporation |
发明人 |
Kerprich Robert;Allison William C.;Scott Diane |
分类号 |
B24B37/26;C08J9/228;B24B37/005;B24B37/20;B24D18/00 |
主分类号 |
B24B37/26 |
代理机构 |
Blakely Sokoloff Taylor Zafman LLP |
代理人 |
Blakely Sokoloff Taylor Zafman LLP |
主权项 |
1. A method of fabricating a polishing pad for polishing a substrate, the method comprising:
mixing a pre-polymer and a curative to form a mixture in the base of a formation mold; moving the lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an alignment forming feature; and, with the lid placed in the mixture, at least partially curing the mixture to form a molded homogeneous polishing body comprising a polishing surface having a pattern of grooves comprising a polishing region with an alignment feature disposed therein, corresponding to the pattern of protrusions and the alignment forming feature of the lid, wherein the alignment feature creates a singular asymmetry within the pattern of grooves. |
地址 |
Hillsboro OR US |