发明名称 Polishing pad with alignment feature
摘要 Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.
申请公布号 US9249273(B2) 申请公布日期 2016.02.02
申请号 US201514610991 申请日期 2015.01.30
申请人 NexPlanar Corporation 发明人 Kerprich Robert;Allison William C.;Scott Diane
分类号 B24B37/26;C08J9/228;B24B37/005;B24B37/20;B24D18/00 主分类号 B24B37/26
代理机构 Blakely Sokoloff Taylor Zafman LLP 代理人 Blakely Sokoloff Taylor Zafman LLP
主权项 1. A method of fabricating a polishing pad for polishing a substrate, the method comprising: mixing a pre-polymer and a curative to form a mixture in the base of a formation mold; moving the lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an alignment forming feature; and, with the lid placed in the mixture, at least partially curing the mixture to form a molded homogeneous polishing body comprising a polishing surface having a pattern of grooves comprising a polishing region with an alignment feature disposed therein, corresponding to the pattern of protrusions and the alignment forming feature of the lid, wherein the alignment feature creates a singular asymmetry within the pattern of grooves.
地址 Hillsboro OR US