发明名称 Three-dimensional mounting semiconductor device and method of manufacturing three-dimensional mounting semiconductor device
摘要 A three-dimensional mounting semiconductor device includes a layer structure including a plurality of first substrates with a trench-shaped concavity formed in and a plurality of second substrates with semiconductor elements formed in, which are alternately stacked, wherein an unevenness defined by a size difference between the first substrate and the second substrate is formed on a side surface, and a first through-hole are defined by an inside surface of the trench-shaped concavity and a surface of the second substrate, and a third substrate jointed to the side surface of the layer structure and having an unevenness formed on a surface jointed to the layer structure which are engaged with the unevenness formed on the side surface of the layer structure.
申请公布号 US9252070(B2) 申请公布日期 2016.02.02
申请号 US201314041073 申请日期 2013.09.30
申请人 FUJITSU LIMITED 发明人 Mizuno Yoshihiro;Kouma Norinao;Tsuboi Osamu
分类号 H01L23/46;H01L23/473;H01L25/065;H01L25/00 主分类号 H01L23/46
代理机构 Staas & Halsey LLP 代理人 Staas & Halsey LLP
主权项 1. A three-dimensional mounting semiconductor device comprising: a layer structure including a plurality of first substrates with a trench-shaped concavity formed in and a plurality of second substrates with semiconductor elements formed in, which are alternately stacked, wherein an unevenness defined by a size difference between the first substrate and the second substrate is formed on a side surface of the layer structure, anda first through-hole is defined by an inside surface of the trench-shaped concavity and a surface of the second substrate; and a third substrate jointed to the side surface of the layer structure and having an unevenness formed on a surface jointed to the layer structure which is engaged with the unevenness formed on the side surface of the layer structure, the third substrate covering the whole area of the side surface of the layer structure, wherein the first substrate, the second substrate and the third substrates are formed of materials of the same thermal expansion coefficient.
地址 Kawasaki JP