Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity

摘要

An electrostatic chuck assembly including a dielectric layer with a top surface to support a workpiece. A cooling channel base disposed below the dielectric layer includes a plurality of inner fluid conduits disposed beneath an inner portion of the top surface, and a plurality of outer fluid conduits disposed beneath an outer portion of the top surface. A chuck assembly includes a thermal break disposed within the cooling channel base between the inner and outer fluid conduits. A chuck assembly includes a fluid distribution plate disposed below the cooling channel base and the base plate to distribute a heat transfer fluid delivered from a common input to each inner or outer fluid conduit. The branches of the inner input manifold may have substantially equal fluid conductance.

主权项

1. A chuck assembly for supporting a workpiece during a manufacturing operation, the chuck assembly comprising:
a top surface of a dielectric layer to support the workpiece; a cooling channel base disposed beneath the top surface; a base plate disposed beneath the cooling channel base; and a thermal break disposed within the cooling channel base and extending into the base plate.