| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a photosensitive resin composition for a color filter, in which a pigment is finely dispersed in high concentration to allow high-definition photolithography and defects due to the presence of foreign substances are substantially prevented.SOLUTION: The production method of a photosensitive resin composition for a color filter includes: a first step of dispersing (C) a pigment in a dispersion medium to obtain an average particle diameter of 50 nm or less of the pigment, wherein the dispersion medium comprises (A) a compound obtained by allowing a cyclic acid anhydride to react with a hydroxy group-containing compound that is obtained by the reaction of a bisphenol fluorene type epoxy compound and an ethylenically unsaturated bond group-containing carboxylic acid, (B) a dispersant, and (Z) a solvent; a second step of compounding (D) a polymerizable monomer having at least one ethylenically unsaturated bond and (E) a photopolymerization initiator into the dispersion liquid obtained in the first step; and a third step of filtering the dispersion liquid obtained in the second step with a filtration accuracy smaller than a film thickness of a cured film to be formed by using the dispersion liquid.SELECTED DRAWING: None |
