DIRECT-DRAWING TYPE EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a direct-drawing type exposure apparatus that can carry out pattern exposure while the optical axis of an exposure beam is orthogonal to an exposure surface of a photosensitive resin.SOLUTION: The direct-drawing type exposure apparatus carries out pattern exposure by directly irradiating a photosensitive resin PP in a film state held by a substrate B with an exposure beam 1b, and the apparatus includes: a light source 1 that outputs the exposure beam 1b; a base 2 that has a recessed part 2s formed by a bottom part 2b and side walls 2w; positioning members 3a to 3d that are set on the side walls 2w and determine a height position of the substrate B during exposure; and displacement mechanisms 5a to 5d that support an edge region of a lower surface of the substrate B and operate to displace the substrate B in the direction of the optical axis of the exposure beam 1b. The substrate B is set at a height position where the optical axis of the exposure beam 1b and an upper surface of the substrate B are orthogonal to each other, while the substrate B is displaced by the displacement mechanisms 5a to 5d to bring an edge region of the upper surface of the substrate B or an upper surface of the photosensitive resin PP into contact with lower surfaces of the positioning members 3d to 3d.SELECTED DRAWING: Figure 1