| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of improving plasma controllability in a circumferential direction in a plasma processing chamber.SOLUTION: A plasma processing apparatus comprises: a plasma generation unit for generating plasma; a helical coil wound around outside of the plasma generation unit; a high-frequency power supply for supplying high-frequency power to the helical coil; and a processing unit for processing a sample by the plasma. In the plasma processing apparatus, the plasma generation unit has a dome shape, and the helical coil has a first helical coil, a second helical coil, and a third helical coil. The plasma processing apparatus comprises a phase controller that controls a phase difference between high-frequency power respectively supplied to the first and second helical coils, a phase difference between high-frequency power respectively supplied to the second and third helical coils, and a phase difference between high-frequency power respectively supplied to the third and first helical coils to a predetermined angle, respectively.SELECTED DRAWING: Figure 1 |
