| 摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive and a substrate polishing method in which grains of hydroxide of tetra-valent metallic element do not aggregate even if the grains and alkali are simultaneously contained.SOLUTION: Provided is: an abrasive containing water, abrasive-grains comprising hydroxide of tetra-valent metallic element, a compound having a structure represented by a particular formula, or inositol, and an alkali; the abrasive in which the contents of the compound having a structure represented by a particular formula, or inositol, is 0.1 fold that of the content of the abrasive-grains comprising hydroxide of tetra-valent metallic element; and the abrasive in which the tetra-valent metallic element is tetra-valent cerium.SELECTED DRAWING: None |
