发明名称 METAL FILM, CONDUCTOR STRUCTURE FOR PRECISION MICROCOMPONENT, MEMS, ELECTRONIC PRODUCT, AND METAL FILM MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method capable of improving adhesion to a substrate to thereby obtain a metal film causing no separation from a resin substrate.SOLUTION: In a metal film manufacturing method, a substrate modification step Q for obtaining a resin substrate having a surface modified to (CH)Si-O (trimethylsiloxane) is provided after a pre-processing cleaning step P1 for a resin substrate, and thereafter, a metal material processing step P2 for allowing a metal material for forming a metal film to adhere on the resin substrate, a heat treatment step P3 subjecting the resin substrate in a metal material adhesion state to heat treatment to form the metal film, an etching step P4 subjecting the metal film to etching, and a finishing plating step P5 are provided in order.SELECTED DRAWING: Figure 1
申请公布号 JP2016018946(A) 申请公布日期 2016.02.01
申请号 JP20140141994 申请日期 2014.07.10
申请人 AOMORI PREFECTURAL INDUSTRIAL TECHNOLOGY RESEARCHCENTER 发明人 IIDA KEIKO
分类号 H05K3/12;B81B7/02;C23C26/00;C23C28/02;H05K3/38 主分类号 H05K3/12
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