发明名称 |
METAL FILM, CONDUCTOR STRUCTURE FOR PRECISION MICROCOMPONENT, MEMS, ELECTRONIC PRODUCT, AND METAL FILM MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of improving adhesion to a substrate to thereby obtain a metal film causing no separation from a resin substrate.SOLUTION: In a metal film manufacturing method, a substrate modification step Q for obtaining a resin substrate having a surface modified to (CH)Si-O (trimethylsiloxane) is provided after a pre-processing cleaning step P1 for a resin substrate, and thereafter, a metal material processing step P2 for allowing a metal material for forming a metal film to adhere on the resin substrate, a heat treatment step P3 subjecting the resin substrate in a metal material adhesion state to heat treatment to form the metal film, an etching step P4 subjecting the metal film to etching, and a finishing plating step P5 are provided in order.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016018946(A) |
申请公布日期 |
2016.02.01 |
申请号 |
JP20140141994 |
申请日期 |
2014.07.10 |
申请人 |
AOMORI PREFECTURAL INDUSTRIAL TECHNOLOGY RESEARCHCENTER |
发明人 |
IIDA KEIKO |
分类号 |
H05K3/12;B81B7/02;C23C26/00;C23C28/02;H05K3/38 |
主分类号 |
H05K3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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