| 摘要 |
PROBLEM TO BE SOLVED: To provide an implant that suppresses the induction into osteoclasts, as well as that promotes the differentiation into osteoblast.SOLUTION: The implant comprises a base material, and a carbonaceous film formed on the surface of the base material, and the production method thereof comprises a step for forming a carbonaceous film, by an inductively coupled plasma-assisted magnetron sputtering method, on the surface of the base material comprising titanium or titanium alloy. In the step for forming a carbonaceous film, sputtering gas is a mixed gas of argon and hydrocarbon, and the amount of hydrogen contained in the carbonaceous film is 12 to 20 atom% and the spC-C/spC-C ratio is 2.0 to 6.5.SELECTED DRAWING: Figure 5 |
