发明名称 ION INJECTION APPARATUS AND CONTROL METHOD FOR ION INJECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To increase the accuracy of a voltage applied to an electrode device.SOLUTION: An ion injection apparatus comprises: a high voltage power source 90; a control device 104 that generates a command signal for controlling a voltage HVoutput from the high voltage power source 90; an electrode device 80 to which the output voltage HVis applied; and a measuring device 120 that measures an actual voltage HVapplied to the electrode device 80. The control device 104 includes: a first generating part 110 that generates a first command signal for causing the high voltage power source 90 to output a target voltage; a second generating part 112 that compensates for the first command signal so that the actual voltage HVmeasured by the measuring device 120 becomes equal to or close to the target voltage; and a command part 114 that outputs a combined signal, obtained by combining the first and second command signals, to the high voltage power source 90.SELECTED DRAWING: Figure 4
申请公布号 JP2016018707(A) 申请公布日期 2016.02.01
申请号 JP20140141481 申请日期 2014.07.09
申请人 SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO LTD 发明人 KAGAWA TADANOBU;YUMIYAMA TOSHIO;KUROSE TAKESHI
分类号 H01J37/317;H01J37/248;H01L21/265 主分类号 H01J37/317
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