METHOD AND APPARATUS FOR FORMING FILMS

摘要

PROBLEM TO BE SOLVED: To provide an antireflection film having a low reflectance.SOLUTION: A film forming method for forming an antireflection film 101 on a glass substrate G placed in a processing container 1 using plasma of a mixed gas containing a plurality of kinds of gas includes; a step for supplying the mixed gas to the processing container 1; a step for producing plasma of the mixed gas in the processing container 1; a film-forming step for forming the antireflection film 101 on the glass substrate G using the mixed gas activated by the plasma; and a step for forming a transparent electrode 102 on the antireflection film 101. In the film-forming step, a flow ratio of at least two kinds of gas contained in the mixed gas is altered over time.SELECTED DRAWING: Figure 5