发明名称 SUBSTRATE WITH FUNCTION OF MEASURING FILM THICKNESS AND METHOD FOR MEASURING THICKNESS OF INSULATING FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for measuring the thickness of an insulating layer that can make a measurement in easy and non-destructive manners.SOLUTION: The method for measuring the thickness of an insulating layer includes the steps of: preparing a substrate 1 provided with an antenna PA having a first metal layer 21, a first insulating layer 41 on the first metal layer 21, and a second metal layer 22 on the first insulating layer 41 facing the metal layer 21; forming a second insulating layer 42 with a thickness to be measured on the second metal layer 22; and calculating the thickness of the second insulating layer 42 based on a measured resonance frequency of the antenna PA.SELECTED DRAWING: Figure 7
申请公布号 JP2016017882(A) 申请公布日期 2016.02.01
申请号 JP20140141569 申请日期 2014.07.09
申请人 SHINKO ELECTRIC IND CO LTD 发明人 KYOZUKA MASAHIRO
分类号 G01B7/06;G01B15/02;H05K3/00;H05K3/46 主分类号 G01B7/06
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