发明名称 METHOD OF MANUFACTURING MAGNETIC DEVICE
摘要 The present invention relates to a method for manufacturing a magnetic device. The method includes the following steps: forming a magnetic layer; forming a lower insulating layer on the magnetic layer by using a first gas, which is an inert gas having a higher atomic weight than argon (Ar); and forming an upper insulating layer on the lower insulating layer by using the Ar. Therefore, the method for manufacturing a magnetic device can prevent magnetic property deterioration caused in the process of forming the insulating layers within a magnetic device, and maintain reliability.
申请公布号 KR20160011069(A) 申请公布日期 2016.01.29
申请号 KR20140092080 申请日期 2014.07.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KI WOONG;LEE, JOON MYOUNG;LIM, WOO CHANG;KIM, SANG YONG
分类号 H01L43/08;G11C11/15;H01L21/31;H01L21/8247;H01L27/115 主分类号 H01L43/08
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