发明名称 |
METHOD OF MANUFACTURING MAGNETIC DEVICE |
摘要 |
The present invention relates to a method for manufacturing a magnetic device. The method includes the following steps: forming a magnetic layer; forming a lower insulating layer on the magnetic layer by using a first gas, which is an inert gas having a higher atomic weight than argon (Ar); and forming an upper insulating layer on the lower insulating layer by using the Ar. Therefore, the method for manufacturing a magnetic device can prevent magnetic property deterioration caused in the process of forming the insulating layers within a magnetic device, and maintain reliability. |
申请公布号 |
KR20160011069(A) |
申请公布日期 |
2016.01.29 |
申请号 |
KR20140092080 |
申请日期 |
2014.07.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, KI WOONG;LEE, JOON MYOUNG;LIM, WOO CHANG;KIM, SANG YONG |
分类号 |
H01L43/08;G11C11/15;H01L21/31;H01L21/8247;H01L27/115 |
主分类号 |
H01L43/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|