| 摘要 |
<p>The method comprises providing (2) a substrate that extends along its plane and comprises a first layer made of an electrically insulating material whose resistivity at a temperature of 20[deg] C is greater than 10 5> omega m and a second layer made of an electrically conductive material whose resistivity at a temperature of 20[deg] C is less than 10 -> 4> omega m, and etching (2) the second layer to define and electrically insulate a working electrode, a counter electrode and a reference electrode. The etching step is carried out by laser radiation pulses. The method comprises providing (2) a substrate that extends along its plane and comprises a first layer made of an electrically insulating material whose resistivity at a temperature of 20[deg] C is greater than 10 5> omega m and a second layer made of an electrically conductive material whose resistivity at a temperature of 20[deg] C is less than 10 -> 4> omega m, and etching (2) the second layer to define and electrically insulate a working electrode including a first measuring face that is parallel to the plane of substrate and has a surface of >= 100 nm 2>, a counter electrode including a second measuring face that is parallel to the plane of substrate, extends around the first measuring face and has a surface, which is ten times greater than that of the first measuring face and a reference electrode including a third measuring face that is parallel to the plane of substrate. The second layer is directly disposed on the first layer, and is made of a carbonaceous material. The etching step is carried out by laser radiation pulses, where a duration of each pulse is less than 100 ps and the pulses are repeated at a repetition frequency of >= 1kHz. An independent claim is included for an electrochemical analysis system.</p> |
