| 发明名称 |
COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT |
| 摘要 |
A COMPOSITION COMPRISING A SOURCE OF METAL IONS AND AT LEAST ONE ADDITIVE COMPRISING AT LEAST ONE POLYAMINOAMIDE REPRESENTED BY FORMULA I OR DERIVATIVES OF A POLYAMINOAMIDE OF FORMULA I OBTAINABLE BY COMPLETE OR PARTIAL PROTONATION, N-QUARTERNISATION OR ACYLATION. |
| 申请公布号 |
MY156200(A) |
申请公布日期 |
2016.01.29 |
| 申请号 |
MY2012PI02167 |
申请日期 |
2010.11.22 |
| 申请人 |
BASF SE |
发明人 |
RÖGER-GÖPFERT, CORNELIA;RAETHER,ROMAN BENEDIKT;MAYER, DIETER;EMNET, CHARLOTTE;ARNOLD, MARCO |
| 分类号 |
C25D3/38 |
主分类号 |
C25D3/38 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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