ANGLE-RESOLVED ANTISYMMETRIC LIGHT WAVE SCATTEROMETRY

摘要

PROBLEM TO BE SOLVED: To provide a method for determining an overlay offset amount of an object to be measured having an overlay structure.SOLUTION: A method for determining an overlay offset includes: obtaining a first antisymmetric differential signal &Dgr;S1 associated with a first scatterometry cell 1010; obtaining a second antisymmetric differential signal &Dgr;S2 associated with a second scatterometry cell 1020; and computing an overlay offset from the first antisymmetric differential signal &Dgr;S1 associated with the first scatterometry cell and the second antisymmetric differential signal &Dgr;S2 associated with the second scatterometry cell 1030.