发明名称 THERMAL TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide thermal treatment equipment capable of reducing a device height.SOLUTION: A thermal treatment device 10 comprises: a lifting pipe 31a which lifts an article support member 50 in a vertical direction in a processing space 16 by a drive force from a motor 21 and moves up and down together with the article support member 50 by the drive force from the motor 21, and which is always located on the left side of the article support member 50; and a lifting pipe 31b which moves up and down together with the article support member 50 by the drive force from the motor 21 and which is always located on the right side of the article support member 50. The motor 21 is arranged outside a chamber 11. The chamber 11 has stepped parts 14a, 14b with uneven surfaces 15a, 15b which face in the vertical direction. The lifting pipes 31a, 31b pierce the stepped parts 14a, 14b. The thermal treatment device 10 comprises bellows 35a, 35b which connect the stepped parts 14a, 14b and the lifting pipes 31a, 31b, respectively, and expand and contract in association with lifting up and down of the lifting pipes 31a, 31b.
申请公布号 JP2016015445(A) 申请公布日期 2016.01.28
申请号 JP20140137730 申请日期 2014.07.03
申请人 NGK INSULATORS LTD 发明人 TANGE MASAJI;MIYASHITA KOICHI;ITO TSUTOMU
分类号 H01L21/683;H01L51/50;H05B33/10 主分类号 H01L21/683
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