WAFER HANDLING TRACTION CONTROL SYSTEM

摘要

A wafer handling traction control system is provided that is able to detect slippage of a semiconductor wafer with respect to an end effector and is able to adjust the end effector's movement in order to minimize further slippage. Upon the detection of relative motion of the semiconductor wafer with respect to the end effector past a threshold amount, the end effector's movements are adjusted to minimize slippage of the semiconductor wafer. The wafer handling traction control system may include a sensor that detects relative motion between the semiconductor wafer and the end effector.

主权项

1. An apparatus comprising:
a first robot arm configured to support a first semiconductor wafer on a first end effector; a first optical sensor configured to detect relative movement between the first semiconductor wafer and the first end effector; and a controller with one or more processors and a memory, wherein the one or more processors, the memory, the first robotic arm, and the first optical sensor are communicatively connected and the memory stores program instructions for controlling the one or more processors to:
a) cause the first robot arm to move according to a first acceleration profile while the first semiconductor wafer is supported by the first end effector,b) receive first optical sensor data from the first optical sensor,c) analyze at least the first optical sensor data to determine first motion data based on relative movement of the first semiconductor wafer with respect to the first end effector during motion of the first robot arm while the first semiconductor wafer is supported by the first end effector,d) determine whether the first motion data attributable to movement of the first robot arm according to the first acceleration profile exceeds a first threshold motion metric, ande) cause the first robot arm to move according to a second acceleration profile when the first motion data attributable to movement of the first robot arm according to the first acceleration profile exceeds the first threshold motion metric, wherein the first motion data attributable to movement of the first robot arm according to the second acceleration profile stays within the first threshold motion metric.