| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning chemicals supply device, a cleaning chemicals supply method, and a cleaning unit which can deal with the change of dilution ratio flexibly, while suppressing upsizing of the device.SOLUTION: A cleaning chemicals supply device has a first inline mixer 72 for supplying first cleaning chemicals to a cleaning device 200, a second inline mixer 73 for supplying second cleaning chemicals to a substrate cleaning device 200, a first chemicals CLC box 120 for controlling the flow rate of the first chemicals supplied to the first inline mixer 72, a second chemicals CLC box 130 for controlling the flow rate of the second chemicals supplied to the second inline mixer 73, and a DIWCLC box 110 for controlling the flow rate of the dilution water supplied to the first inline mixer 72 or the second inline mixer 73. The cleaning chemicals supply device is configured to switch the supply destination of the dilution water from the first inline mixer 72 to the second inline mixer 73, or from the second inline mixer 73 to the first inline mixer 72. |
