| 摘要 |
PROBLEM TO BE SOLVED: To detect changes in a reticle pattern in an early stage with high accuracy.SOLUTION: A reticle 5 includes a first pattern 12 to be resolved in a resist film and used for forming a circuit, and a second pattern 13 to be not resolved in a resist pattern nor used for forming a circuit. The second pattern 13 includes a plurality of edges 15A in an opening where light passes, and the number of edges per unit area is larger than that of the first pattern 12. By rotating the second pattern 13 and subjecting to a multiple exposure process, an image derived from the opening is formed in the resist film. By checking a dimension of the formed image, dimensional changes in the first pattern 12 and the second pattern 13 can be detected in an early stage with high accuracy. |
