发明名称 BISMUTH-VANADATE-LAMINATE MANUFACTURING METHOD AND BISMUTH-VANADATE LAMINATE
摘要 A new BiVO4-laminate manufacturing method and BiVO4 laminate are provided. A bismuth-vanadate laminate is manufactured as follows: a substrate that can be heated by microwaves is disposed inside a precursor solution containing a vanadium salt and a bismuth salt, microwave-activated chemical bath deposition (MW-CBD) is used to form a bismuth-vanadate layer on the substrate, and a firing process is performed as necessary. A bismuth-vanadate laminate manufactured in this way is suitable for use as a photocatalyst or photoelectrode.
申请公布号 US2016028092(A1) 申请公布日期 2016.01.28
申请号 US201414772643 申请日期 2014.03.04
申请人 TOKYO UNIVERSITY OF SCIENCE FOUNDATION ;MITSUI CHEMICALS, INC. ;JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS 发明人 KUDO Akihiko;JIA Qingxin;IWASE Akihide
分类号 H01M4/90;C25B11/04;H01M4/88 主分类号 H01M4/90
代理机构 代理人
主权项 1. A bismuth-vanadate-laminate manufacturing method comprising the step of: arranging a substrate heatable with microwaves in a precursor solution containing a vanadium salt and a bismuth salt, and forming a bismuth-vanadate layer on the substrate by microwave-activated chemical bath deposition (MW-CBD).
地址 Shinjuku-ku, Tokyo JP