发明名称 |
BISMUTH-VANADATE-LAMINATE MANUFACTURING METHOD AND BISMUTH-VANADATE LAMINATE |
摘要 |
A new BiVO4-laminate manufacturing method and BiVO4 laminate are provided. A bismuth-vanadate laminate is manufactured as follows: a substrate that can be heated by microwaves is disposed inside a precursor solution containing a vanadium salt and a bismuth salt, microwave-activated chemical bath deposition (MW-CBD) is used to form a bismuth-vanadate layer on the substrate, and a firing process is performed as necessary. A bismuth-vanadate laminate manufactured in this way is suitable for use as a photocatalyst or photoelectrode. |
申请公布号 |
US2016028092(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
US201414772643 |
申请日期 |
2014.03.04 |
申请人 |
TOKYO UNIVERSITY OF SCIENCE FOUNDATION ;MITSUI CHEMICALS, INC. ;JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS |
发明人 |
KUDO Akihiko;JIA Qingxin;IWASE Akihide |
分类号 |
H01M4/90;C25B11/04;H01M4/88 |
主分类号 |
H01M4/90 |
代理机构 |
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代理人 |
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主权项 |
1. A bismuth-vanadate-laminate manufacturing method comprising the step of:
arranging a substrate heatable with microwaves in a precursor solution containing a vanadium salt and a bismuth salt, and forming a bismuth-vanadate layer on the substrate by microwave-activated chemical bath deposition (MW-CBD). |
地址 |
Shinjuku-ku, Tokyo JP |