发明名称 FORMING SELF-ALIGNED CONDUCTIVE LINES FOR RESISTIVE RANDOM ACCESS MEMORIES
摘要 Resistive random access memory elements, such as phase change memory elements, may be defined using a plurality of parallel conductive lines over a stack of layers, at least one of which includes a resistive switching material. The stack may be etched using the conductive lines as a mask. As a result, memory elements may be self-aligned to the conductive lines.
申请公布号 US2016028002(A1) 申请公布日期 2016.01.28
申请号 US201514876540 申请日期 2015.10.06
申请人 MICRON TECHNOLOGY, INC. 发明人 TORTORELLI INNOCENZO;PELLIZZER FABIO;PETRUZZA PIETRO
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A method, comprising: forming a stack, wherein the stack includes a barrier layer; forming a first plurality of trenches and a second plurality of trenches in the barrier layer, wherein trenches of the first plurality of trenches are spaced from each other by trenches of the second plurality of trenches; filling the first plurality of trenches with a dielectric material; filling the second plurality of trenches with metal; and using said metal as a hard mask, removing said stack to form a plurality of stacks separated by the second plurality of trenches.
地址 BOISE ID US