| 摘要 |
Provided is a substrate storage container with which air within the main body of the container can be replaced efficiently with a substrate protection gas. This substrate storage container is equipped with: a container main body (1) capable of storing multiple semiconductor wafers (W); a gas supply valve that supplies a purge gas to the interior of the container main body (1); and a gas exchange unit (40) that blows the purge gas from the gas supply valve into the container main body (1). The container main body (1) is formed as a front-opening box, with the gas supply valve mounted in the rear part of a bottom plate (6) of the container main body. The gas exchange unit (40) is configured from a housing (41) in which the purge gas from the gas supply valve accumulates, and a cover (52) covering the open front surface (42) of the housing (41). The lower part of the housing (41) is connected to the gas supply valve so as to allow the purge gas to circulate, the upper part of the housing (41) is supported by a back surface wall (18) of the container main body (1), and multiple blow-holes (55) for blowing the purge gas in the direction of the front surface (2) of the container main body (1) are formed in the housing (41) or the cover (52). |
