发明名称 |
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING PHOTOLITHOGRAPHIC RINSE SOLUTION |
摘要 |
A photolithographic rinse solution includes deionized water, and a surfactant, the surfactant including a cyclic amine group and at least one non-amine cyclic group joined to or fused with the cyclic amine group, wherein the cyclic amine group includes a ring having a carbon number of 4 to 6, and the non-amine cyclic group includes a ring having a carbon number of 5 to 8. |
申请公布号 |
US2016026090(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
US201514878034 |
申请日期 |
2015.10.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KOH Chawon;KIM Su Min;KIM Hyunwoo;YUN Hyojin |
分类号 |
G03F7/40;G03F7/20;G03F7/32;G03F7/16 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Suwon-si KR |