发明名称 |
Developing Method, Developing Apparatus, and Computer-Readable Recording Medium |
摘要 |
There is provided a method of developing an exposed resist film formed on a surface of a substrate to form a resist pattern, which includes: rotating the substrate about a rotation axis that extends in a direction perpendicular to the surface of the substrate that is horizontally supported; supplying a developing solution through a discharge hole positioned above the substrate onto the resist film such that the developing solution is widely spread on a surface of the resist film; and positioning a wetted part having a surface that faces the surface of the substrate, above a preceding region in the surface of the substrate, the preceding region being a region to which the developing solution is preferentially supplied through the discharge hole. |
申请公布号 |
US2016026087(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
US201514802810 |
申请日期 |
2015.07.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ISEKI Tomohiro;TAKEGUCHI Hirofumi;TERASHITA Yuichi |
分类号 |
G03F7/32 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
1. A method of developing an exposed resist film formed on a surface of a substrate to form a resist pattern, the method comprising:
rotating the substrate about a rotation axis that extends in a direction perpendicular to the surface of the substrate that is horizontally supported; supplying a developing solution through a discharge hole positioned above the substrate onto the resist film such that the developing solution is widely spread on a surface of the resist film; and positioning a wetted part having a surface that faces the surface of the substrate, above a preceding region in the surface of the substrate, the preceding region being a region to which the developing solution is preferentially supplied through the discharge hole. |
地址 |
Tokyo JP |