发明名称 CONDITIONING SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING A CONDITIONING SYSTEM
摘要 Disclosed is a conditioning system (200) for a lithographic apparatus comprising a plurality of modules (215). The conditioning system comprises a common conditioning medium for the plurality of modules; a plurality of conditioning branches (220) conveying the conditioning medium, one for each module (or a subset of modules); a plurality of thermal actuators (225), each operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors (230), each operable to sense the temperature of the common conditioning medium at one of the conditioning branches.
申请公布号 WO2016012175(A1) 申请公布日期 2016.01.28
申请号 WO2015EP64113 申请日期 2015.06.23
申请人 ASML NETHERLANDS B.V. 发明人 WESTERLAKEN, JAN, STEVEN, CHRISTIAAN;MATHEW, ALEXANDRIOS;RUTTEN, ROB, JOHAN, THEODOOR
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址