发明名称 |
CONDITIONING SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING A CONDITIONING SYSTEM |
摘要 |
Disclosed is a conditioning system (200) for a lithographic apparatus comprising a plurality of modules (215). The conditioning system comprises a common conditioning medium for the plurality of modules; a plurality of conditioning branches (220) conveying the conditioning medium, one for each module (or a subset of modules); a plurality of thermal actuators (225), each operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors (230), each operable to sense the temperature of the common conditioning medium at one of the conditioning branches. |
申请公布号 |
WO2016012175(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
WO2015EP64113 |
申请日期 |
2015.06.23 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WESTERLAKEN, JAN, STEVEN, CHRISTIAAN;MATHEW, ALEXANDRIOS;RUTTEN, ROB, JOHAN, THEODOOR |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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