EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding apparatus which can easily performing maintenance work and prevent liquid from penetrating into a rear surface side of a substrate.SOLUTION: A substrate holder PH comprises: base material PHB; a first holding part PH1 which is formed on the base material PHB and holds a substrate P by suctioning the substrate; and a second holding part PH2 which is formed on the base material PHB and holds a plate member T by suctioning the plate member near the substrate P suctioned and held by the first holding part PH1. In an exposure device comprising the substrate holder PH, replace of a plate can be easily performed and maintenance work can be easily performed. Therefore, the exposure device is suitable for immersion exposure.