发明名称 METHOD FOR MANUFACTURING 3,4,5-TRICAFFEOYLQUINIC ACID
摘要 Provided are a method for manufacturing 3,4,5-tricaffeoylquinic acid, which can produce 3,4,5-tricaffeoylquinic acid with high efficiency by a simple operation in a short process using inexpensive raw materials, and intermediate compounds. The method for manufacturing 3,4,5-tricaffeoylquinic acid of the invention includes at least Step (1) of allowing a compound represented by Formula (1) or a compound represented by Formula (2) to react with a compound represented by Formula (4); and Step (2) of deprotecting the product obtained in Step (1), and producing 3,4,5-tricaffeoylquinic acid:;
申请公布号 US2016023986(A1) 申请公布日期 2016.01.28
申请号 US201514876931 申请日期 2015.10.07
申请人 FUJIFILM CORPORATION 发明人 SATO Kozo;NAITO Hiroyuki;MURAKAMI Takeshi
分类号 C07C69/732;C07C67/24 主分类号 C07C69/732
代理机构 代理人
主权项 1. A method for manufacturing 3,4,5-tricaffeoylquinic acid, the method comprising at least Step (1) of allowing a compound represented by Formula (1) or a compound represented by Formula (2) to react with a compound represented by Formula (4); and Step (2) of deprotecting the product obtained in Step (1), and producing 3,4,5-tricaffeoylquinic acid represented by Formula (6): where in Formula (1), R1 represents a hydrogen atom or a hydroxyl protective group; R2 represents a hydrogen atom or a carboxyl protective group; at least one of R1 and R2 is not a hydrogen atom or R1 and R2 are joined together to form a protective group represented by —B(Ra)—; Ra represents a C1-6 alkyl group which may be substituted, an aryl group which may be substituted, or a C1-6 alkoxy group which may be substituted; and R3, R4 and R5, which are identical or different, each represent a hydrogen atom or a group represented by Formula (3), in Formula (2), Y represents *1—ORb; Rb either does not exist or represents a hydrogen atom; *1 represents the position of bonding to a carbon atom represented by C1; A either does not exist or represents a monovalent cation; M represents a boron atom, a silicon atom, a divalent metal ion, or a trivalent metal ion; and m represents an integer of 2 or 3,when M is a boron atom, m represents 2, and A represents a monovalent cation; when M is a silicon atom, m represents 2, and A does not exist; when M is a divalent metal ion, m represents 2, and A does not exist; and when M is a trivalent metal ion, m represents 3, and A does not exist, andat least one of R3, R4, and R5 represents a hydrogen atom: where in Formula (3), R6 and R7, which are identical or different, each represent a phenolic hydroxyl protective group; or R6 and R7 are joined together to form a protective group selected from the group consisting of a carbonyl group (—CO—) and a methylene group which may be substituted; and * represents the position of bonding to an oxygen atom of the compound represented by Formula (1), and where in Formula (4), X1 represents a hydroxyl group or a leaving group; and R6 and R7 have the same meanings as described above.
地址 Tokyo JP