| 发明名称 |
METHOD FOR GENERATING PATTERN, STORAGE MEDIUM, AND INFORMATION PROCESSING APPARATUS |
| 摘要 |
A method for generating a pattern includes defining a footprint of a main pattern in each cell, arranging a first cell and a second cell which has an auxiliary pattern outside the footprint of the main pattern, side by side in such a manner that the auxiliary pattern outside the footprint of the second cell is present in the footprint of the main pattern of the first cell, and generating the pattern of the mask by removing a pattern element of the auxiliary pattern outside the footprint of the second cell in a portion where the pattern element of the auxiliary pattern outside the footprint of the second cell is close to or overlaps with the main pattern in the first cell of the first cell and the second cell arranged side by side. |
| 申请公布号 |
US2016026743(A1) |
申请公布日期 |
2016.01.28 |
| 申请号 |
US201514802851 |
申请日期 |
2015.07.17 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Ishii Hiroyuki;Nakayama Ryo;Arai Tadashi |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for generating a pattern of a mask by arranging side by side a plurality of cells selected from a cell library containing a plurality of cells using a processor, the method comprising:
defining a footprint of a main pattern in each cell; arranging side by side a first cell and a second cell, which has an auxiliary pattern outside the footprint of the main pattern, in such a manner that the auxiliary pattern outside the footprint of the second cell is present in the footprint of the main pattern of the first cell; and generating the pattern of the mask by removing a pattern element of the auxiliary pattern in a portion where a pattern element of the auxiliary pattern outside the footprint of the second cell is close to or overlaps with the main pattern in the first cell of the first cell and the second cell arranged side by side. |
| 地址 |
Tokyo JP |
