发明名称 ADAPTIVE PROCESSES FOR IMPROVING INTEGRITY OF SURFACES
摘要 A process for performing localized corrective actions to structure of an electronic device is described. The structure may include a mating surface configured to receive another structured such that the two structures may be, for example, adhesively bonded together. The localized corrective actions are configured not to improve the mating surface but to also prevent light within the electronic device from escaping in undesired areas of the electronic device. In some embodiments, the corrective action includes using a removal tool to remove identified portions of the surface. In other embodiments, the corrective action includes using a different tool to add material identified portions of the surface. The identified means may include an automated inspection system.
申请公布号 WO2016014047(A1) 申请公布日期 2016.01.28
申请号 WO2014US47763 申请日期 2014.07.23
申请人 APPLE INC. 发明人 LEGGETT, WILLIAM F.;LANCASTER-LAROQUE, SIMON REGIS LOUIS
分类号 G06F1/16 主分类号 G06F1/16
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