| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a maintenance method of the film deposition apparatus capable of improving maintainability.SOLUTION: A film deposition apparatus includes a vacuum chamber, a film deposition source arranged in the vacuum chamber, a deposition prevention plate 91 provided in the vacuum chamber, a deposition prevention plate heater for heating the deposition prevention plate 91, and a recovery part for recovering a film deposition material dropped from the deposition prevention plate 91. |
