发明名称 OZONE GENERATOR AND OZONE GENERATION METHOD
摘要 In order to generate ozone, which is used for ashing and plasma cleaning, plasma generated in a decompressed chamber is conventionally used. But it is difficult to reduce the production cost of an ozone generation, because facility cost and process cost are expensive in a decompressed process. According to the present invention, ozone is generated by atmospheric pressure plasma CVD using dielectric barrier discharge generated by a plasma head where a plurality of plasma head unit members are installed in parallel to generate plasma by applying electric field or magnetic field via a dielectric member. Stable glow discharge plasma is formed even under atmospheric pressure by dielectric barrier discharge. Then, ozone can be generated under atmospheric pressure, and semiconductor device with low cost can be fabricated.
申请公布号 US2016023900(A1) 申请公布日期 2016.01.28
申请号 US201314442011 申请日期 2013.11.11
申请人 WACOM 发明人 KUSUHARA Masaki
分类号 C01B13/11;C23C16/34;C25B1/13;C23C16/54;C23C16/515;C23C16/505 主分类号 C01B13/11
代理机构 代理人
主权项 1. An ozone generator wherein a desired number of flow passage plates are stacked, and each discharge electrode, which is comprised of a ceramic member having a hollow portion and an electrode wire is place without contact with the ceramic member, is placed at the gas outlet side of the each flow passage plate.
地址 Chuo-ku, Tokyo JP