| 发明名称 |
FORMING A SUBSTRATE WEB TRACK IN AN ATOMIC LAYER DEPOSITION REACTOR |
| 摘要 |
An apparatus and method for forming a substrate web track with a repeating pattern into a reaction space of a deposition reactor by moving a first set of support rolls in relation to a second set of support rolls. |
| 申请公布号 |
SG11201509884R(A) |
申请公布日期 |
2016.01.28 |
| 申请号 |
SG11201509884R |
申请日期 |
2013.06.27 |
| 申请人 |
PICOSUN OY |
发明人 |
MALINEN, TIMO;KILPI, VÄINÖ |
| 分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
| 代理机构 |
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