Wet Etching Apparatus and the Etching Method Thereof

摘要

The present invention discloses wet etching apparatus, which comprises an etching tank, multiple rollers provided inside the etching tank, immersion tank and a lifter. The multiple rollers are used to carry a substrate to be etched. Wherein, the immersion tank is provided inside the etching tank and below the rollers, the lifter is provided on the lower surface of the bottom plate of the etching tank, and the lifter pushes the immersion tank up or down, so that the substrate to be etched is immersed in or out of the etchant in the immersion tank. The present invention can fill the immersion tank with new etchant while the multiple rollers transfer the substrate to the etching tank, which is beneficial to shorten the immersing and etching time.

主权项

1. A wet etching apparatus, comprising an etching tank and multiple rollers provided inside the etching tank, the multiple rollers being used to carry a substrate to be etched; wherein, the wet etching apparatus further comprising an immersion tank and a lifter; wherein, the immersion tank is provided inside the etching tank and below the rollers, the lifter is provided on the lower surface of the bottom plate of the etching tank, and the lifter pushes the immersion tank up or down, so that the substrate to be etched is immersed in or out of the etchant in the immersion tank.