| 摘要 |
PROBLEM TO BE SOLVED: To provide: an apparatus for a smudge-resistant structure that is resistant to fingerprints, smudges, scratches and/or other marks without degrading the display image quality; and related fabrication methods.SOLUTION: A smudge-resistant structure 100 includes a transparent substrate 102 having a macrostructured surface 106 configured to reduce contact with the transparent substrate, and an oxidizing layer 120 overlying the macrostructured surface. |
