发明名称 |
METHOD FOR PRODUCING A POLYLACTIC ACID-BASED FILM OR SHEET |
摘要 |
A method of producing a polylactic acid based film or sheet with improved heat resistance and comprised of a resin composition containing a polylactic acid according to a melt film forming method, wherein the resin composition comprises polylactic acid (A), an acidic functional group-denatured olefin based polymer (B) containing an acidic functional group, and having an acid number of 10-70 mg KOH/g and a weight average molecular weight of 10,000-80,000, and a tetrafluoroethylene based polymer (C), which method comprises performing melt film formation at a temperature of the resin composition between the crystallization temperature (Tc) in a decreasing temperature process of the resin composition +15° C. and the melting temperature (Tm) in a raising temperature process −5° C., or solidifying the resin composition melt-formed in a film state by cooling after a temperature controllable step at crystallization temperature (Tc) in the decreasing temperature process ±10° C. |
申请公布号 |
US2016024265(A1) |
申请公布日期 |
2016.01.28 |
申请号 |
US201514875736 |
申请日期 |
2015.10.06 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
ISHIGURO Shigeki;SENDA Hiroki |
分类号 |
C08J5/18;B29C43/00;B29C43/24 |
主分类号 |
C08J5/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method of producing a film or sheet of a resin composition containing a polylactic acid according to a melt film forming method, wherein the resin composition comprises polylactic acid (A), an acidic functional group-denatured olefin based polymer (B) containing an acidic functional group, and having an acid number of 10-70 mg KOH/g and a weight average molecular weight of 10,000-80,000, and a tetrafluoroethylene based polymer (C), which method comprises performing a melt film formation step at a temperature of the resin composition between the crystallization temperature (Tc) in a decreasing temperature process of the resin composition +15° C. and the melting temperature (Tm) in a raising temperature process −5° C., or solidifying the resin composition melt-formed in a film state by cooling after a crystallization promoting step at crystallization temperature (Tc) in a decreasing temperature process ±10° C. |
地址 |
Osaka JP |