摘要 |
PROBLEM TO BE SOLVED: To provide an optical element module capable of surely reducing the parasitic load and contact load occurring in the optical element of a micro lithography system, and to provide a holding structure of an optical element unit.SOLUTION: An optical element module includes an optical element unit 108 having an optical element, and a support structure 109. The support structure supports the optical element unit and includes a contactor installed in a support device. The contactor acts on a holding force occurring on the optical element unit in a first direction via the first contact surface of the contactor, and the first contact surface is in contact with the second contact surface of the optical element unit. The contactor has a first link and a second link extending in a second direction traversing the first direction. |