| 摘要 |
Provided is an element substrate including a substrate, a metal layer, and a planar layer. The metal layer is located on the substrate and has a first edge in a first direction. The planar layer is located on the metal layer and includes a contact hole. The contact hole has an adjacent wall and a bottom surface. The metal layer is exposed on the bottom surface. A contour line of the adjacent wall on a perpendicular plane is a curved line. The first edge vertically corresponds to a critical point in the contour line. A gradient of a tangent line on the critical point of the contour line is smaller than 0.176. |
