发明名称 A method for measuring a high accuracy height map of a test surface
摘要 The invention relates to a method for measuring a high accuracy height map of a test surface using a multi sensor optical profiler. The method comprises: measuring a coarse height map of the test surface with a pre-map sensor provided to the optical profiler with a relatively long working distance and/or a large field of view; storing the coarse height map in a memory; subdividing the coarse height map into sections as appropriate for the field of view of a relatively high resolution optical profiler sensor provided to the optical profiler; calculating the corresponding X, Y and Z positions for the high resolution optical profiler sensor with respect to the test surface; calculating a trajectory in the X, Y, Z-direction for the high resolution optical profiler sensor with respect to the test surface using the calculated X, Y, Z-positions; moving the optical profiler in the X, Y, Z-direction with respect to the test surface according to the trajectory; and, measuring a high accuracy height map with the high resolution optical profiler sensor.
申请公布号 EP2977720(A1) 申请公布日期 2016.01.27
申请号 EP20140178509 申请日期 2014.07.25
申请人 MITUTOYO CORPORATION 发明人 ZUIDERWEG, ADRIAAN TIEMEN;QUAEDACKERS, JOHANNES ANNA;VISSCHER, HARM
分类号 G01B21/20;G01B11/24 主分类号 G01B21/20
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