发明名称 |
LED element, and production method therefor |
摘要 |
Provided is an LED element which achieves high light extraction efficiency even at low operating voltages and which can be produced using a simple process. The LED element has a first semiconductor layer made of a p-type nitride semiconductor, a light-emitting layer made of a nitride semiconductor formed on the upper layer of the first semiconductor layer, a second semiconductor layer made of an n-type nitride semiconductor formed on the upper layer of the light-emitting layer, and a transparent electrode formed on the whole surface of the second semiconductor layer. The second semiconductor layer in at least a region that is in contact with the transparent electrode is made of AlnGa1-nN (0<n<1) and has an n-type impurity concentration larger than 1×1019/cm3. |
申请公布号 |
US9246059(B2) |
申请公布日期 |
2016.01.26 |
申请号 |
US201314428161 |
申请日期 |
2013.09.05 |
申请人 |
USHIO DENKI KABUSHIKI KAISHA |
发明人 |
Miyoshi Kohei;Tsukihara Masashi |
分类号 |
H01L29/24;H01L29/20;H01L33/32;H01L33/38;H01L33/42;H01L33/00;H01L33/62 |
主分类号 |
H01L29/24 |
代理机构 |
Studebaker & Brackett PC |
代理人 |
Studebaker & Brackett PC |
主权项 |
1. An LED element comprising:
a support substrate made of a conductor or a semiconductor; a conductive layer formed on an upper layer of the support substrate; an insulating layer formed so that a bottom surface thereof is in contact with a portion of an upper surface of the conductive layer; a first semiconductor layer made of a p-type nitride semiconductor formed so that a bottom surface thereof is in contact with a portion of the upper surface of the conductive layer and a portion of an upper surface of the insulating layer; a light-emitting layer made of a nitride semiconductor formed on an upper layer of the first semiconductor layer; a second semiconductor layer made of an n-type nitride semiconductor formed on the upper layer of the light-emitting layer; a transparent electrode formed on an entire upper surface of the second semiconductor layer; and a power supply terminal formed so that a bottom surface thereof is in contact with a portion of an upper surface of the transparent electrode, wherein the second semiconductor layer in at least a region that is in contact with the transparent electrode is made of AlnGa1-nN (0<n<1) and has an n-type impurity concentration larger than 1×1019/cm3. |
地址 |
Tokyo JP |