Manufacturing method of photovoltaic device and manufacturing apparatus for photovoltaic device

摘要

A manufacturing method includes a step of forming an impurity diffusion layer by diffusing an impurity element in a surface of a silicon-based substrate; and an etching step of removing the impurity diffusion layer in at least a portion of a first-surface side of the silicon-based substrate, wherein the etching step includes an etching-fluid supplying step of, on the first-surface side, supplying an etching fluid that flows to an outer edge portion of the silicon-based substrate from a supply position, and an air supplying step of, on a second-surface side, which is opposite to the first-surface side, of the silicon-based substrate, supplying air in a same direction as the etching fluid in accordance with supply of the etching fluid at the etching-fluid supplying step.

主权项

1. A manufacturing method of a photovoltaic device, comprising:
a step of forming an impurity diffusion layer by diffusing an impurity element in a surface of a silicon-based substrate; an etching step of removing the impurity diffusion layer of an outer edge portion of a first-surface side of the silicon-based substrate, and a step of forming an anti-reflective film on a second-surface side of the silicon based substrate, wherein the etching step includes
an etching-fluid supplying step of, on the first-surface side, supplying an etching fluid that flows only within the outer edge portion of the silicon-based substrate towards the outer edge of the silicon-based substrate from a supply position, andan air supplying step of, on the second-surface side, which is opposite to the first-surface side, of the silicon-based substrate, supplying air in a same direction as the etching fluid in accordance with supply of the etching fluid towards the outer edge of the silicon-based substrate at the etching-fluid supplying step.