发明名称 Film-forming composition
摘要 A film-forming composition including a triazine ring-containing hyperbranched polymer with a repeating unit structure indicated by formula (1), and inorganic micro particles is provided. This enables the provision of a film-forming composition capable of hybridizing without reducing dispersion of the inorganic micro particles in a dispersion fluid, capable of depositing a coating film with a high refractive index, and suitable for electronic device film formation.; (In the formula, R and R′ are mutually independent and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar indicates a divalent organic group including either an aromatic ring or a heterocyclic ring, or both.)
申请公布号 US9243165(B2) 申请公布日期 2016.01.26
申请号 US201113818546 申请日期 2011.08.23
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 Kato Taku;Murakami Natsumi;Koyama Yoshinari;Nishimura Naoya;Ozawa Masaaki
分类号 C09D179/02;C08G73/02;C08G73/06;C09D179/04;C09D201/00;H01L31/0232 主分类号 C09D179/02
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A film formed from a film-forming composition characterized by comprising a triazine ring-containing hyperbranched polymer which includes recurring unit structures of formula (1) belowwherein R and R′ are each independently a hydrogen atom or an alkyl, alkoxy, aryl or aralkyl group; and Ar is a divalent organic group which includes either of, or both, an aromatic ring and a heterocycle, and inorganic fine particles having a primary particle size of 2 to 50 nm, said particles being colloidal particles of an oxide of at least one metal selected from the group consisting of Be, Al, Si, Ti, V, Fe, Cu, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Ta, W, Pb, Bi, and Ce, and wherein the inorganic fine particles are surface-treated with an organosilicon compound.
地址 Tokyo JP