发明名称 Metal pads with openings in integrated circuits
摘要 A device includes a metal pad, and a passivation layer including portions overlapping edge portions of the metal pad. A Post-Passivation-Interconnect (PPI) includes a trace portion overlying the passivation layer, and a pad portion connected to the trace portion. A polymer layer includes an upper portion over the PPI, and a plug portion extending into, and encircled by, the pad portion of the PPI.
申请公布号 US9245833(B2) 申请公布日期 2016.01.26
申请号 US201313764569 申请日期 2013.02.11
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chen Shuo-Mao;Huang Yu-Ting
分类号 H01L23/48;H01L23/52;H01L29/40;H01L23/498;H01L23/31;H01L23/00;H01L23/525 主分类号 H01L23/48
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A device comprising: a metal pad; a passivation layer comprising portions overlapping edge portions of the metal pad, wherein the metal pad and the passivation layer are comprised in a chip; a Post-Passivation-Interconnect (PPI) comprising: a trace portion overlying the passivation layer; anda pad portion connected to the trace portion; and a first polymer layer comprising: an upper portion over the PPI; anda plug portion extending into, and encircled by, the pad portion of the PPI, wherein the plug portion penetrates through the pad portion, with a bottom surface of the plug portion connected to a bottom surface of the pad portion to form a substantially continuous bottom surface; a molding material encircling the chip; and a second polymer layer over the metal pad, wherein a top surface of the molding material and a top surface of the second polymer layer are substantially in a same horizontal plane parallel to a top surface of the metal pad.
地址 Hsin-Chu TW