Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

摘要

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods.

主权项

1. A silicon-containing composition for thin-film deposition comprising an amino-silyl amine compound represented by the following Chemical Formula 1: in Chemical Formula 1, R1 to R5 are each independently hydrogen, halogen, (C1-C7)alkyl, (C2-C7)alkenyl, (C2-C7)alkynyl, (C3-C7)cycloalkyl, or (C6-C12)aryl; R6 and R7 are each independently hydrogen, (C1-C7)alkyl, (C2-C7)alkenyl, (C2-C7)alkynyl, (C3-C10)cycloalkyl, or (C6-C12)aryl, provided that a case where all R1 to R7 are methyl is excluded; and the alkyl, alkenyl, alkynyl, cycloalkyl, and aryl of R1 to R5, and the alkyl, alkenyl, alkynyl, cycloalkyl, and aryl of R6 and R7 may be further substituted with halogen, (C1-C7)alkyl, (C1-C7)alkoxy, or (C1-C7)aryloxy.