发明名称 |
Resin for thermal imprinting |
摘要 |
A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.; |
申请公布号 |
US9242407(B2) |
申请公布日期 |
2016.01.26 |
申请号 |
US201414449661 |
申请日期 |
2014.08.01 |
申请人 |
SCIVAX CORPORATION;MARUZEN PETROCHEMICAL CO., LTD. |
发明人 |
Takemori Toshifumi;Takaya Yoshiaki;Mita Takahito;Iizuka Tetsuya;Hashima Yuji;Kusuura Takahisa;Fujii Mitsuru;Taguchi Takuji;Mitra Anupam |
分类号 |
B29C59/02;B29C59/00;C08F232/08;H05K1/03;H05K3/00;H05K3/10;B29K45/00 |
主分类号 |
B29C59/02 |
代理机构 |
Factor Intellectual Property Law Group, Ltd. |
代理人 |
Factor Intellectual Property Law Group, Ltd. |
主权项 |
1. A method of using a cyclic-olefin-based thermoplastic resin for an imprint process, the resin being used for producing a film by spin coating method, and containing at least one of skeletons represented by a chemical equation 9 or a chemical equation 10 in a main chain, and wherein:
a glass transition temperature Tg (° C.) of the resin and a value ([M]) of MFR at 260° C. satisfy a equation 1; and
[M]<20 and Tg>90° C. and wherein the chemical equation 9 is represented by: the chemical equation 10 is represented by: and the equation 1 is:
Tg(° C.)>219×log[M]−160; and further wherein R1 to R29 in chemical equation 9 and chemical equation 10 may differ or may be same, each of which is a substituent containing a hydrogen atom, a deuterium atom, a hydrocarbon radical having a carbon number of 1 to 15, a halogen atom, or a hetero atom of oxygen, sulfur, or the like, and may form a monocyclic or polycyclic structure with one another; m and n are integers greater than or equal to 0; and, [M] in equation 1 represents a value of MFR at 260° C. |
地址 |
Kanagawa JP |