Quantum cascade laser

摘要

A quantum cascade laser includes a semiconductor substrate, and an active layer that is provided on the substrate, and has a cascade structure in which emission layers and injection layers are alternately laminated by multistage-laminating unit laminate structures each consisting of the quantum well emission layer and the injection layer, the active layer generates light by intersubband transition in a quantum well structure. Further, in a laser cavity structure for light with a predetermined wavelength to be generated in the active layer, reflection control films including at least one layer of CeO2 film are formed on a first end face and a second end face facing each other. Thereby, it is possible to realize a quantum cascade laser capable of preferably realizing reflectance control for light within a mid-infrared wavelength region on the laser device end face.

主权项

1. A quantum cascade laser comprising:
a semiconductor substrate; and an active layer that is provided on the semiconductor substrate, and has a cascade structure in which quantum well emission layers and injection layers are alternately laminated by multistage-laminating unit laminate structures each consisting of the quantum well emission layer and the injection layer, the active layer generates light by intersubband transition in a quantum well structure, wherein in a laser cavity structure in a device main body including the semiconductor substrate and the active layer, for light with a predetermined wavelength within a wavelength region of 7 to 15 μm to be generated in the active layer, a reflection control film including at least one layer of CeO2 film is formed on at least one device end face of a first end face and a second end face of the device main body facing each other, the reflection control film is a multilayer film in which the CeO2 film serving as a low refraction index film and a high refraction index film are laminated, and the CeO2 film is formed directly on the device end face of the device main body as the first layer in the reflection control film, and the high refraction index film in the multilayer film is a Ge film.