| 摘要 |
Systems and methods for transferring liquid precursor to a substrate processing system include the steps of: supplying a liquid precursor by using a first valve fluidically communicating with a liquid precursor source; supplying a purge gas by using a second valve for fluidically communicating with a purge gas source; arranging a third valve which has a first input port fluidically communicating with an output port of the first valve, and a second input port fluidically communicating with an output port of the second valve; arranging an input port of a first direction switch injector valve fluidically communicating with an output port of the third valve; and operating the first valve, the second valve, the third valve, the first direction switch injector valve in a first mode, a second mode, a third mode, and a fourth mode. |
