| 摘要 |
A three dimensional virtual shape modeling method based on a semiconductor process is disclosed. According to the present invention, the modeling method three-dimensionally models a result which is generated by a process of deposition, etching, or the like such as a semiconductor or flat display panel manufacturing process. Especially, modeling is conveniently performed by using a two dimensional projection method when a layer, which is being etched after deposition, is formed on a previous layer, which is not flat. |
